| 1. | The best annealing condition of the zno films grown by electron beam evaporation technique was achieved
采用电子束蒸发的方法在si衬底上生长zno薄膜，通过退火实验，得到了最佳的退火条件。 |
| 2. | In this paper , high quality transparent and conductive al - doped zno thin films on quartz substrates are prepared by electron beam evaporation technique
本文采用电子束蒸发方法在石英衬底上制备出质量较好的al掺杂的zno薄膜材料。 |
| 3. | Tungsten oxide and nickel oxide films were prepared by electron beam evaporation method , and the effect of annealing techniques of the electrochromic properties of these films was discussed
本论文利用电子束蒸发方法制备氧化钨、氧化镍薄膜的基础上，研究了热处理工艺对于薄膜电致变色性能的影响。 |
| 4. | Study on the fabricating method the fe / al2o3 / fe mtj and co / al2o3 / feni mtj are prepared by ion - beam sputtering systems . the fexcu ( 1 - x ) granule films were evaporated directly using a high vacuum electron beam evaporation . some samples of granule films are annealed at 340c
用高真空镀膜机制备了fe _ xcu _ ( ( 1 - x ) )系列颗粒膜，并对部分膜做了加热退火处理，样品被加热到340并且保温2小时。 |
| 5. | 1 . the manganin ultra - high pressure sensors for gas gun were made by two - step thin film techniques , namely , manganin thin films were first deposited by magnetron sputtering on a12o3 substrates , and then covered by a layer of a12o3 thin films by electron beam evaporation
首次采用全薄膜化工艺制作气炮用锰铜超高压力传感器，即首先在绝缘基板上沉积锰铜敏感薄膜，然后再在敏感膜的上面沉积绝缘封装薄膜。 |
| 6. | The ultra - thin er layers with the thicanesses in the range of 0 . 5 ~ 3 monolayer ( ml ) are formed by electron beam evaporation on si ( 00l ) substrate at room temperature in an ultra - high vacuum system . after annealing at lower temperatures , ordered simcfores form on the surface . the trallsition of the surface reconsmiction pattem from ( 2 x l ) to ( 4 x 2 ) with the increase of er coverage up to l ml is observed by the reflective high energy electron diffraction ( rheed ) and low energy electron diffraction ( leed )
本文是关于硅( 001 )衬底与电子束淀积的铒、铪原子反应形成的超薄膜的界面与表面性质的研究，以及在该衬底上出现的共振光电子发射现象，包括了以下四个方面的工作： 1铒导致的硅( 001 )衬底上的( 4 2 )再构研究利用反射高能电子衍射和低能电子衍射，在室温淀积了0 |
| 7. | In this dissertation , high quality ( 002 ) textured zno films were prepared on silicon substrate using electron beam evaporation method . in addition , zno nano - particle material embedded into mgo thin films was prepared by a co - evaporation ( thermal and electron beam evaporation , simultaneously ) method and a following post - annealing process in oxygen ambient
本文介绍了采用电子束蒸发方法在si衬底表面上制备出了具有c轴择优取向的高质量氧化锌薄膜材料，另外，还采用共蒸发(通过电子束蒸发与热蒸发同时进行)及后退火的简单方法制备出包埋到介电物质mgo薄膜中的zno量子点材料。 |
| 8. | The main conclusions and original results are summarized as follows . the manganin ultra - high pressure sensors for gas gun were made by two - step thin film techniques , namely , manganin thin films were first deposited by magnetron sputtering on fused silica substrates , and then covered by a layer of sio2 thin films by electron beam evaporation . consequently , the manganin sensing elements were " cleanly " encapsulated in inorganic solid matrix and the high - pressure shunt effect was eliminated radically
上述技术的主要优点在于可以采用高压绝缘性能更好的无机物作为绝缘封装材料，如本研究中所采用的sio2 ，而代替在箔式锰铜计中所使用的ptfe ；并可实现敏感元件“清洁”地无机固态封装，即将整个敏感元件是包封在无机物中，而不与高压力下绝缘性能相对较差的有机物，如粘接剂、树脂等直接接触，从而在根本上消除了高压旁路效应。 |
| 9. | The experimental results show that the quality of zno films prepared by electron beam evaporation can be greatly improved by means of two - step annealing of metallic zn films in oxygen ambient , and it is feasible to fabricate high quality mgxzn1 - xo alloy films with mgo buffer layers by using thermal evaporation technique following by two - step annealing process . this method gives a new path to prepare mgxzn1 - xo alloy films
实验结果表明利用电子束蒸发技术制备的zno薄膜材料，在经过氧气气氛下的二次退火处理后，能够表现出较好的发光和结构特性；以mgo薄膜作为缓冲层制备出了高质量的mgzno合金薄膜材料，这为开展mgzno合金薄膜材料的研究开辟了新的途径。 |
| 10. | Abstract : in the paper , the operation technology of electron beam evaporation plating aluminium - chromium alloy coating is studied the optimum technology is obtained by discussing the influence of votage , current on auter appearance , adhesion inner stress . the ingredients of coation and evaporation materials are analyzed , the results show that the chromium contents of coating are very different from that of evaporation materials , in the end , the corrosion - resistance of the coating consisting of different chromium contents is investigated
文摘:本文研究了电子束蒸发镀铝-铬合金涂层的制备工艺，通过讨论不同的电压、束流对膜层外观、结合力、内应力的影响，确定了合适的陈镀工艺,对涂层和膜料的成分进行了分析，表明涂层中铬含量与膜料中铬含量有较大差异,最后探讨了不同含铬量的涂层的耐蚀性。 |
